An Integrated Spatial Signature Analysis and Automatic Defect Classification System
نویسندگان
چکیده
wafermap with double-slot (right), chemical vapor deposition contamination (lower-right), and mechanical scratch (upper-left) signatures. Top: a typical high-resolution image used for automatic defect classification. An Integrated Spatial Signature Analysis and Automatic Defect Classification System Shaun S. Gleason, Kenneth W. Tobin, Thomas P. Karnowski Oak Ridge National Laboratory P.O. Box 2008, Bldg 3546, MS 6011 Oak Ridge, Tennessee, 37831 E-mail: [email protected]
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